Fabrication of three-dimensional hemispherical structures using photolithography

Chee Tiong Lim, Hong Yee Low, Johnson K.K. Ng, Wen Tso Liu, Yong Zhang

Research output: Contribution to journalArticlepeer-review


A photolithography technique using SU-8 and PDMS was developed to fabricate three-dimensional hemispherical structures. This technique utilized a mask-aligner and normal binary coded photomasks to generate hemispherical pits on SU-8, followed by PDMS molding to obtain an array of dome-shaped structures. Using this technique, a microfluidic device was fabricated with a patterning area that consisted of an array of 5 μm wells and dome-shaped structures with 10 μm diameter and 6 μm height. Encoded microbeads, 6 μm in size, were immobilized and patterned in the microfluidic device under flow conditions and a DNA hybridization experiment was performed to demonstrate the incorporation of encoded beads that would enable a high level of multiplexing in bioassays.

Original languageEnglish (US)
Pages (from-to)721-726
Number of pages6
JournalMicrofluidics and Nanofluidics
Issue number5
StatePublished - Nov 2009
Externally publishedYes


  • 3D structures
  • Microfluidics
  • Photolithography
  • SU-8
  • Soft lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Materials Chemistry


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