Fabrication of submicrometric magnetic structures by electron-beam lithography

J. I. Martín; Y. Jaccard; A. Hoffmann; J. Nogués; J. M. George; J. L. Vicent; Ivan K. Schuller

doi:10.1063/1.368042

Fabrication of submicrometric magnetic structures by electron-beam lithography

J. I. Martín, Y. Jaccard, A. Hoffmann, J. Nogués, J. M. George, J. L. Vicent, Ivan K. Schuller

Research output: Contribution to journal › Article › peer-review

Abstract

Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films.

Original language	English (US)
Pages (from-to)	411-415
Number of pages	5
Journal	Journal of Applied Physics
Volume	84
Issue number	1
DOIs	https://doi.org/10.1063/1.368042
State	Published - Jul 1 1998
Externally published	Yes

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Physics and Astronomy(all)

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10.1063/1.368042

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abstract = "Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films.",

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AU - Martín, J. I.

AU - Jaccard, Y.

AU - Hoffmann, A.

AU - Nogués, J.

AU - George, J. M.

AU - Vicent, J. L.

AU - Schuller, Ivan K.

PY - 1998/7/1

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AB - Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films.

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Fabrication of submicrometric magnetic structures by electron-beam lithography

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