Fabrication of submicrometric magnetic structures by electron-beam lithography

J. I. Martín, Y. Jaccard, A. Hoffmann, J. Nogués, J. M. George, J. L. Vicent, Ivan K. Schuller

Research output: Contribution to journalArticlepeer-review


Submicrometric magnetic structures have been fabricated by electron-beam lithography on Si substrates. High-quality patterns have been obtained with typical length scale of the structures in the range of 100 nm. The designed geometrical configurations are suitable for investigation of their physical properties by transport measurements in a controlled way. In particular, long chains of connected magnetic dots are useful to analyze magnetization reversal processes, whereas ordered arrays of isolated dots can be used to study pinning effects in superconducting films.

Original languageEnglish (US)
Pages (from-to)411-415
Number of pages5
JournalJournal of Applied Physics
Issue number1
StatePublished - Jul 1 1998
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)


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