Fabrication of nanowires with high aspect ratios utilized by dry etching with SF6: C4F8 and self-limiting thermal oxidation on Si substrate
Si Young Park
, Sandro J. Di Giacomo
, R. Anisha
, Paul R. Berger
, Phillip E. Thompson
, Ilesanmi Adesida
Research output: Contribution to journal › Article › peer-review
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