Fabrication of gray-scale semiconductor structures with dynamic digital projection photochemical etching

Kaiyuan Wang, Chris Edwards, Shailendra N. Srivastava, Lynford L. Goddard

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Digital projection photochemical etching is a novel single-step process for fabricating customized gray-scale semiconductor structures. Several features including a variable height pyramid array are fabricated, demonstrating the resolution, range, accuracy, and dynamics of the technique.

Original languageEnglish (US)
Title of host publication2015 Conference on Lasers and Electro-Optics, CLEO 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781557529688
StatePublished - Aug 10 2015
EventConference on Lasers and Electro-Optics, CLEO 2015 - San Jose, United States
Duration: May 10 2015May 15 2015

Publication series

NameConference on Lasers and Electro-Optics Europe - Technical Digest
Volume2015-August

Other

OtherConference on Lasers and Electro-Optics, CLEO 2015
CountryUnited States
CitySan Jose
Period5/10/155/15/15

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Keywords

  • Arrays
  • Etching
  • Fabrication
  • Gallium arsenide
  • Gray-scale
  • Surface topography

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials

Cite this

Wang, K., Edwards, C., Srivastava, S. N., & Goddard, L. L. (2015). Fabrication of gray-scale semiconductor structures with dynamic digital projection photochemical etching. In 2015 Conference on Lasers and Electro-Optics, CLEO 2015 [7184024] (Conference on Lasers and Electro-Optics Europe - Technical Digest; Vol. 2015-August). Institute of Electrical and Electronics Engineers Inc..