Fabrication of gray-scale semiconductor structures with dynamic digital projection photochemical etching

Kaiyuan Wang, Chris Edwards, Shailendra N. Srivastava, Lynford L Goddard

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Digital projection photochemical etching is a novel single-step process for fabricating customized gray-scale semiconductor structures. Several features including a variable height pyramid array are fabricated, demonstrating the resolution, range, accuracy, and dynamics of the technique.

Original languageEnglish (US)
Title of host publicationCLEO
Subtitle of host publicationScience and Innovations, CLEO-SI 2015
PublisherOptical Society of America (OSA)
Number of pages1
ISBN (Electronic)9781557529688
DOIs
StatePublished - May 4 2015
EventCLEO: Science and Innovations, CLEO-SI 2015 - San Jose, United States
Duration: May 10 2015May 15 2015

Publication series

NameCLEO: Science and Innovations, CLEO-SI 2015

Other

OtherCLEO: Science and Innovations, CLEO-SI 2015
CountryUnited States
CitySan Jose
Period5/10/155/15/15

    Fingerprint

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics

Cite this

Wang, K., Edwards, C., Srivastava, S. N., & Goddard, L. L. (2015). Fabrication of gray-scale semiconductor structures with dynamic digital projection photochemical etching. In CLEO: Science and Innovations, CLEO-SI 2015 (CLEO: Science and Innovations, CLEO-SI 2015). Optical Society of America (OSA). https://doi.org/10.1364/CLEO_SI.2015.STh3G.2