Abstract
Fabrication of apertures, slots, and grooves in silicon, gold-palladium, and lithium fluoride has been demonstrated using a 100 kev electron beam. For the LiF films the authors have been able to etch less than 2 nm wide by 50 nm deep grooves on 10 nm centers. Grooves in silicon 8 nm wide by 30 nm deep have been made by reactive ion etching in SF//6. Apertures as small as 8 nm in diameter have been produced in AuPd films self-supported over larger holes in 60 nm thick Si windows.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1091-1095 |
| Number of pages | 5 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 1 |
| Issue number | 4 |
| DOIs | |
| State | Published - 1983 |
| Externally published | Yes |
| Event | Proc of the Int Symp on Electron, Ion, and Photon Beams - Los Angeles, CA, USA Duration: May 31 1983 → Jun 3 1983 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering