Fabrication of a thin film micro polarization array

Viktor Gruev, Wu Kejia, Jan Van Der Spiegel, Nader Engheta

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A thin film polarizer has been patterned and etched using reactive ion etching (RIE) in order to create 14 micron circular periodic structures. The polarization thin film has extinction ratio of 60dB in the blue and green visible spectrum and ∼40db in the red spectrum. Various gas combinations for RIE has been explored and it has been experimentally determined that for a particular concentration of CF4 and O2 an optimum etching rate, in terms of speed and under-etching, is possible. Theoretical explanation for the optimum etching rate has been also presented. In addition, anisotropic etching with less then 0.5 μm under cutting has been achieved. Experimental results of the patterned structures under polarized light are presented.

Original languageEnglish (US)
Title of host publicationISCAS 2006
Subtitle of host publication2006 IEEE International Symposium on Circuits and Systems, Proceedings
Pages209-212
Number of pages4
StatePublished - Dec 1 2006
Externally publishedYes
EventISCAS 2006: 2006 IEEE International Symposium on Circuits and Systems - Kos, Greece
Duration: May 21 2006May 24 2006

Publication series

NameProceedings - IEEE International Symposium on Circuits and Systems
ISSN (Print)0271-4310

Other

OtherISCAS 2006: 2006 IEEE International Symposium on Circuits and Systems
CountryGreece
CityKos
Period5/21/065/24/06

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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    Gruev, V., Kejia, W., Van Der Spiegel, J., & Engheta, N. (2006). Fabrication of a thin film micro polarization array. In ISCAS 2006: 2006 IEEE International Symposium on Circuits and Systems, Proceedings (pp. 209-212). [1692559] (Proceedings - IEEE International Symposium on Circuits and Systems).