TY - GEN
T1 - Fabrication of a thin film micro polarization array
AU - Gruev, Viktor
AU - Kejia, Wu
AU - Van Der Spiegel, Jan
AU - Engheta, Nader
PY - 2006
Y1 - 2006
N2 - A thin film polarizer has been patterned and etched using reactive ion etching (RIE) in order to create 14 micron circular periodic structures. The polarization thin film has extinction ratio of 60dB in the blue and green visible spectrum and ∼40db in the red spectrum. Various gas combinations for RIE has been explored and it has been experimentally determined that for a particular concentration of CF4 and O2 an optimum etching rate, in terms of speed and under-etching, is possible. Theoretical explanation for the optimum etching rate has been also presented. In addition, anisotropic etching with less then 0.5 μm under cutting has been achieved. Experimental results of the patterned structures under polarized light are presented.
AB - A thin film polarizer has been patterned and etched using reactive ion etching (RIE) in order to create 14 micron circular periodic structures. The polarization thin film has extinction ratio of 60dB in the blue and green visible spectrum and ∼40db in the red spectrum. Various gas combinations for RIE has been explored and it has been experimentally determined that for a particular concentration of CF4 and O2 an optimum etching rate, in terms of speed and under-etching, is possible. Theoretical explanation for the optimum etching rate has been also presented. In addition, anisotropic etching with less then 0.5 μm under cutting has been achieved. Experimental results of the patterned structures under polarized light are presented.
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M3 - Conference contribution
AN - SCOPUS:34547308190
SN - 0780393902
SN - 9780780393905
T3 - Proceedings - IEEE International Symposium on Circuits and Systems
SP - 209
EP - 212
BT - ISCAS 2006
T2 - ISCAS 2006: 2006 IEEE International Symposium on Circuits and Systems
Y2 - 21 May 2006 through 24 May 2006
ER -