Fabrication of a dual-tier thin film micropolarization array

Viktor Gruev, Alessandro Ortu, Nathan Lazarus, Jan Van Der Spiegel, Nader Engheta

Research output: Contribution to journalArticle

Abstract

A thin film polarization filter has been patterned and etched using reactive ion etching (RIE) in order to create 8 by 8 microns square periodic structures. The micropolarization filters retain the original extinction ratios of the unpatterned thin film. The measured extinction ratios on the micropolarization filters are ∼1000 in the blue and green visible spectrum and ∼100 in the red spectrum. Various gas combinations for RIE have been explored in order to determine the right concentration mix of CF4 and O2 that gives optimum etching rate, in terms of speed and underetching. Theoretical explanation for the optimum etching rate has also been presented. In addition, anisotropic etching with 1μom under cutting of a 10μm thick film has been achieved. Experimental results for the patterned structures under polarized light are presented. The array of micropolarizers will be deposited on top of a custom made CMOS imaging sensor in order to compute the first three Stokes parameters in real time.

Original languageEnglish (US)
Pages (from-to)4994-5007
Number of pages14
JournalOptics Express
Volume15
Issue number8
DOIs
StatePublished - Apr 16 2007
Externally publishedYes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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  • Cite this

    Gruev, V., Ortu, A., Lazarus, N., Van Der Spiegel, J., & Engheta, N. (2007). Fabrication of a dual-tier thin film micropolarization array. Optics Express, 15(8), 4994-5007. https://doi.org/10.1364/OE.15.004994