Abstract
In this paper we present a procedure for fabricating an array of micropolarization filter array via an optimized interference lithography and microfabrication procedure. The filter array is composed of two linear polarization filters offset by 45 degrees with pixel pitch of 18 microns. The individual polarization filters are composed of aluminum nanowires with 140 nm pitch, 140 nm height and 70 nm width.
| Original language | English (US) |
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| Pages | 3130-3133 |
| Number of pages | 4 |
| DOIs | |
| State | Published - 2012 |
| Externally published | Yes |
| Event | 2012 IEEE International Symposium on Circuits and Systems, ISCAS 2012 - Seoul, Korea, Republic of Duration: May 20 2012 → May 23 2012 |
Other
| Other | 2012 IEEE International Symposium on Circuits and Systems, ISCAS 2012 |
|---|---|
| Country/Territory | Korea, Republic of |
| City | Seoul |
| Period | 5/20/12 → 5/23/12 |
ASJC Scopus subject areas
- Hardware and Architecture
- Electrical and Electronic Engineering