In this paper we present a procedure for fabricating an array of micropolarization filter array via an optimized interference lithography and microfabrication procedure. The filter array is composed of two linear polarization filters offset by 45 degrees with pixel pitch of 18 microns. The individual polarization filters are composed of aluminum nanowires with 140 nm pitch, 140 nm height and 70 nm width. The maximum extinction ratio of the pixelated filters is measured to be 95 at 700nm wavelength.
|Original language||English (US)|
|Number of pages||9|
|State||Published - Nov 21 2011|
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics