Fabrication of 10-nm gratings using STM chemical vapor deposition

A. Archer, J. M. Hetrick, Munir H Nayfeh

Research output: Contribution to journalArticlepeer-review

Abstract

Using STM assisted chemical vapor deposition (STM-CVD), we have successfully fabricated what we believe are the finest gratings to date. Our best grating consists of half-micron long evenly spaced lines which have a width of 10 nm and a 10 nm interspacing. The gratings were fabricated on passivated p-type silicon 〈111〉 using trimethylaluminum (TMA) as a precursor gas. Although the composition of the nanostructures is not exactly known at this time, we believe that the lines are partially metallic. We made some systematic investigations to optimize the resolution, including studies of the effect of tunneling current, tip speed, tip-sample biasing voltage, and the effect of formation of very fine TMA whiskers on the tip.

Original languageEnglish (US)
Pages (from-to)649-653
Number of pages5
JournalMaterials Research Society Symposium - Proceedings
Volume452
StatePublished - 1997

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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