Fabrication and optical characterization of Nanopore Si

Hyunjong Jin, Gang Logan Liu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have fabricated nanotextured Si substrates that exhibit controllable optical reflection intensities and colors. Si Nanopore, which has photon-trapping nanostructure but has abrupt changes in the index of refraction displaying a darkened specular reflection. Aluminum is evaporated on the surface of N-type Si by e-beam evaporation. Nanopore structure is formed by a two-step AAO formation in oxalyic acid. Diameter size from 30 to 80 nm is achieved, depending on the condition of anodization and etch. Deep reactive ionic etch (DRIE) is done, with AAO as the mask layer. The nanopore AAO template allows etching depth of up to 1600 nm. By tuning the nanoscale silicon structure, the optical reflection peak wavelength and intensity are changed, making the surface to have different reflectivity and apparent colors. Parameters that affect the fabrication are evaluated. Optical properties of various pore depths are discussed. The relation between the surface optical properties with the spatial features of the photon trapping nanostructures is examined. The tunable photon trapping silicon structures have potential applications in enhancing the performance of semiconductor photoelectric devices.

Original languageEnglish (US)
Title of host publicationNanoengineering
Subtitle of host publicationFabrication, Properties, Optics, and Devices VIII
DOIs
StatePublished - Oct 19 2011
EventNanoengineering: Fabrication, Properties, Optics, and Devices VIII - San Diego, CA, United States
Duration: Aug 23 2011Aug 24 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8102
ISSN (Print)0277-786X

Other

OtherNanoengineering: Fabrication, Properties, Optics, and Devices VIII
CountryUnited States
CitySan Diego, CA
Period8/23/118/24/11

Fingerprint

Nanopore
Nanopores
Trapping
optical reflection
Fabrication
Photon
trapping
Nanostructures
Optical Properties
fabrication
Photons
Silicon
photons
color
optical properties
Photoelectric devices
specular reflection
Optical properties
Semiconductor Devices
Refraction

Keywords

  • Anodized aluminum oxide
  • Nanopore
  • Nanotexture
  • Subwavelength nanostructures

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Jin, H., & Liu, G. L. (2011). Fabrication and optical characterization of Nanopore Si. In Nanoengineering: Fabrication, Properties, Optics, and Devices VIII [810211] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8102). https://doi.org/10.1117/12.893663

Fabrication and optical characterization of Nanopore Si. / Jin, Hyunjong; Liu, Gang Logan.

Nanoengineering: Fabrication, Properties, Optics, and Devices VIII. 2011. 810211 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8102).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Jin, H & Liu, GL 2011, Fabrication and optical characterization of Nanopore Si. in Nanoengineering: Fabrication, Properties, Optics, and Devices VIII., 810211, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8102, Nanoengineering: Fabrication, Properties, Optics, and Devices VIII, San Diego, CA, United States, 8/23/11. https://doi.org/10.1117/12.893663
Jin H, Liu GL. Fabrication and optical characterization of Nanopore Si. In Nanoengineering: Fabrication, Properties, Optics, and Devices VIII. 2011. 810211. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.893663
Jin, Hyunjong ; Liu, Gang Logan. / Fabrication and optical characterization of Nanopore Si. Nanoengineering: Fabrication, Properties, Optics, and Devices VIII. 2011. (Proceedings of SPIE - The International Society for Optical Engineering).
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