TY - JOUR
T1 - Fabricating three dimensional nanostructures using two photon lithography in a single exposure step
AU - Jeon, Seokwoo
AU - Malyarchuk, Viktor
AU - Rogers, John A
AU - Wiederrecht, Gary P.
PY - 2006/3
Y1 - 2006/3
N2 - Conformable phase masks, transparent photopolymers and two photon effects provide the basis for a simple, parallel lithographic technique that can form complex, but well defined three dimensional (3D) nanostructures in a single exposure step. This paper describes the method, presents examples of its ability to form 3D nanostructures (including free standing particles with controlled shapes) and comprehensive modeling of the associated optics. Single step, large area 3D pattern definition, subwavelength resolution and experimental simplicity represent features that make this method potentially useful for applications in photonics, biotechnology and other areas.
AB - Conformable phase masks, transparent photopolymers and two photon effects provide the basis for a simple, parallel lithographic technique that can form complex, but well defined three dimensional (3D) nanostructures in a single exposure step. This paper describes the method, presents examples of its ability to form 3D nanostructures (including free standing particles with controlled shapes) and comprehensive modeling of the associated optics. Single step, large area 3D pattern definition, subwavelength resolution and experimental simplicity represent features that make this method potentially useful for applications in photonics, biotechnology and other areas.
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U2 - 10.1364/OE.14.002300
DO - 10.1364/OE.14.002300
M3 - Article
C2 - 19503567
AN - SCOPUS:33645067652
SN - 1094-4087
VL - 14
SP - 2300
EP - 2308
JO - Optics Express
JF - Optics Express
IS - 6
ER -