Abstract
Ellipsometry is a well-established metrological technique that is used, particularly in the semiconductor industry, to determine the optical constants of semiconductor surfaces, as well as, the thickness of thin films. Due to the igh accuracy required in measuring these parameters, an ideal ellipsometric measurement would require absolute calibration of both the source and the detector. This paper demonstrates the feasibility of entangled-photon quantum ellipsometry using semiconductor samples.
Original language | English (US) |
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Title of host publication | Conference on Quantum Electronics and Laser Science (QELS) - Technical Digest Series |
Volume | 89 |
State | Published - 2003 |
Externally published | Yes |
Event | Trends in Optics and Photonics Series: Quantum electronics and Laser Science (QELS) - Baltimore, MD., United States Duration: Jun 1 2003 → Jun 6 2003 |
Other
Other | Trends in Optics and Photonics Series: Quantum electronics and Laser Science (QELS) |
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Country/Territory | United States |
City | Baltimore, MD. |
Period | 6/1/03 → 6/6/03 |
ASJC Scopus subject areas
- General Physics and Astronomy