Abstract
The theoretical simulation of single Pb atom motion in faulted and unfaulted halves of a Si(111)-(7×7) surface were performed using the kinetic Monte Carlo method. Modifying diffusion barriers within the unit cell, the results were fitted to STM observations over a wide temperature range between 50 and 300 K. The average activation energy of a single atom jump was estimated to be approximately 0.1-0.2 eV, giving a diffusion coefficient of ≈3×10-5 cm2s-1 at 300 K inside the Si(111)-(7×7) unit cell.
Original language | English (US) |
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Pages (from-to) | 339-347 |
Number of pages | 9 |
Journal | Surface Science |
Volume | 544 |
Issue number | 2-3 |
DOIs | |
State | Published - Oct 20 2003 |
Externally published | Yes |
Keywords
- Monte Carlo simulations
- Scanning tunneling microscopy
- Surface diffusion
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry