Evaporative lithography offers a promising new route for patterning a broad array of soft materials. In this approach, a mask is placed above a drying film to create regions of free and hindered evaporation, which drive fluid convection and entrained particles to regions of highest evaporative flux. We show that binary colloidal films exhibit remarkable pattern formation when subjected to a periodic evaporative landscape during drying.
|Original language||English (US)|
|Number of pages||9|
|Journal||Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences|
|State||Published - Dec 28 2009|
ASJC Scopus subject areas
- Physics and Astronomy(all)