Evaporative lithographic patterning of binary colloidal films

Daniel J. Harris, Jacinta C. Conrad, Jennifer A. Lewis

Research output: Contribution to journalArticlepeer-review

Abstract

Evaporative lithography offers a promising new route for patterning a broad array of soft materials. In this approach, a mask is placed above a drying film to create regions of free and hindered evaporation, which drive fluid convection and entrained particles to regions of highest evaporative flux. We show that binary colloidal films exhibit remarkable pattern formation when subjected to a periodic evaporative landscape during drying.

Original languageEnglish (US)
Pages (from-to)5157-5165
Number of pages9
JournalPhilosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences
Volume367
Issue number1909
DOIs
StatePublished - Dec 28 2009

Keywords

  • Colloids
  • Drying
  • Films
  • Lithography

ASJC Scopus subject areas

  • Mathematics(all)
  • Physics and Astronomy(all)
  • Engineering(all)

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