EUV mask preparation considering blank defects mitigation

Yuelin Du, Hongbo Zhang, Martin D F Wong, Rasit O. Topaloglu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Due to the absence of defect-free blanks in extreme ultraviolet (EUV) lithography, defect mitigation is necessary before mass production. Currently almost all the defect mitigation methods are focused on mitigating the defect impact of one blank on one design. However, since the EUV mask vendors always have multiple designs and blanks in hand, it is also very important to consider all designs and blanks together to mitigate the total defect impact. This paper proposes a new EUV mask preparation strategy which optimally matches a set of defective blanks with multiple designs to mitigate the total defect impact. In the first step, an efficient layout relocation algorithm is adopted to minimize the defect impact of each blank on each design. Then, depending on whether blank defects are allowed to be compensated, we formulate the two different types of design-blank matching problems as flow problems and solve them optimally. Compared to sequential matching, the proposed simultaneous matching strategy shows advantages in both blank utilization and defect compensation cost minimization.

Original languageEnglish (US)
Title of host publicationPhotomask Technology 2011
DOIs
StatePublished - Nov 23 2011
EventPhotomask Technology 2011 - Monterey, CA, United States
Duration: Sep 19 2011Sep 22 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8166
ISSN (Print)0277-786X

Other

OtherPhotomask Technology 2011
CountryUnited States
CityMonterey, CA
Period9/19/119/22/11

Fingerprint

blanks
Ultraviolet
Mask
Masks
Preparation
Extremes
masks
Defects
preparation
defects
Cost Minimization
Extreme ultraviolet lithography
relocation
Extreme Ultraviolet Lithography
Relocation
Matching Problem
layouts
Design
Layout
lithography

Keywords

  • Blank defect mitigation
  • Design blank matching
  • EUV
  • Mask preparation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Du, Y., Zhang, H., Wong, M. D. F., & Topaloglu, R. O. (2011). EUV mask preparation considering blank defects mitigation. In Photomask Technology 2011 [816611] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8166). https://doi.org/10.1117/12.896996

EUV mask preparation considering blank defects mitigation. / Du, Yuelin; Zhang, Hongbo; Wong, Martin D F; Topaloglu, Rasit O.

Photomask Technology 2011. 2011. 816611 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8166).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Du, Y, Zhang, H, Wong, MDF & Topaloglu, RO 2011, EUV mask preparation considering blank defects mitigation. in Photomask Technology 2011., 816611, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8166, Photomask Technology 2011, Monterey, CA, United States, 9/19/11. https://doi.org/10.1117/12.896996
Du Y, Zhang H, Wong MDF, Topaloglu RO. EUV mask preparation considering blank defects mitigation. In Photomask Technology 2011. 2011. 816611. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.896996
Du, Yuelin ; Zhang, Hongbo ; Wong, Martin D F ; Topaloglu, Rasit O. / EUV mask preparation considering blank defects mitigation. Photomask Technology 2011. 2011. (Proceedings of SPIE - The International Society for Optical Engineering).
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