Esaki diodes based on interband tunneling have the characteristics of negative differential resistance (NDR) and ultrafast transient time, which lead to broad applications including oscillators, multivalue memories, and terahertz detectors. In this paper, we present the first demonstration of Esaki diodes based on 2-D/3-D heterojunctions - more specifically, chemical vapor deposition MoS2 on degenerately doped silicon. As compared to traditional 3-D heterostructures, these 2-D/3-D heterostructures have the following advantages: dislocation-free 2-D crystals even when the lattices are mismatched, dangling bond-free surface, and capability for large-scale synthesis at low cost. In this paper, monolayer, bilayer, and trilayer MoS2 are synthesized directly on degenerated Si substrate, forming the ultraclean heterostructures without surface contamination from tape and resist. Based on these pristine heterostructures, we are able to observe prominent NDR effect at room temperature. This NDR effect is attributed to the degenerately p-type doping in silicon and the natural n-type doping in MoS2. We also found that the peak voltage corresponding to the local maximum tunneling current depends on the MoS2 thickness. While MoS2 is changing from the monolayer (0.7 nm) to bulk (9.5 nm), the peak voltage increases from 0.8 to 1.6 V. This phenomenon can be explained by the energy-level differences between the monolayer and bulk MoS2. This paper provides the experimental groundwork for the synthesis of transition metal dichalcogenides on degenerately doped Si substrates and opens up new and exciting opportunities for electronic applications of 2-D/3-D heterostructures.
- 2-D/3-D heterojunctions
- Esaki diodes
- chemical vapor deposition (CVD)
- degenerately doped silicon
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering