Erosion and degradation of EUV lithography collector mirrors under particle bombardment

Jean Paul Allain, Ahmed Hassanein, Martin Nieto, Vladimir Titov, Perry Plotkin, Edward Hinson, Bryan J. Rice, R. Bristol, Daniel Rokusek, Wayne Lytle, Brent J Heuser, Monica M.C. Allain, Hyunsu Ju, Christopher Chrobak

Research output: Contribution to journalConference article

Abstract

In extreme ultraviolet lithography (EUVL) environments both laser produced plasma (LPP) and gas discharge produced plasma (GDPP) configurations face serious issues regarding components lifetime and performance under particle bombardment, in particular collector mirrors. For both configurations debris, fast ions, fast neutrals, and condensable EUV radiator fuels (Li, Sn) can affect collector mirrors. In addition, collector mirrors are exposed to impurities (H,C,O,N), off-band radiation (depositing heat) and highly-charged ions leading to their degradation and consequently limiting 13.5 nm light reflection intensity. The IMPACT (Interaction of Materials with charged Particles and Components Testing) experiment at Argonne studies radiation-induced, thermodynamic and kinetic mechanisms that affect the performance of optical mirror surfaces. Results of optical component interaction with singly-charged inert gases (Xe) and alternate radiators (e.g. Sn) are presented for glancing incidence mirrors (i.e., Ru, Pd) at bombarding energies between 100-1000 eV at room temperature. Measurements conducted include: In-situ surface analysis: Auger electron spectroscopy, X-ray photoelectron spectroscopy, direct recoil spectroscopy and low-energy ion scattering spectroscopy; Ex-situ surface analysis: X-ray reflectivity, X-ray diffraction, atomic force microscopy and at-wavelength EUV reflectivity (NIST-SURF).

Original languageEnglish (US)
Article number136
Pages (from-to)1110-1117
Number of pages8
JournalProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Volume5751
Issue numberII
DOIs
StatePublished - Sep 19 2005
EventEmerging Lithographic Technologies IX - San Jose, CA, United States
Duration: Mar 1 2005Mar 3 2005

Keywords

  • EUV collector optics
  • EUV reflectivity
  • Ion scattering spectroscopy
  • Multilayer erosion
  • Sputtering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Biomaterials
  • Radiology Nuclear Medicine and imaging

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    Allain, J. P., Hassanein, A., Nieto, M., Titov, V., Plotkin, P., Hinson, E., Rice, B. J., Bristol, R., Rokusek, D., Lytle, W., Heuser, B. J., Allain, M. M. C., Ju, H., & Chrobak, C. (2005). Erosion and degradation of EUV lithography collector mirrors under particle bombardment. Progress in Biomedical Optics and Imaging - Proceedings of SPIE, 5751(II), 1110-1117. [136]. https://doi.org/10.1117/12.598515