Enhanced effect of a plasma-irradiated titanium substrate on the photocatalytic activity of a TiO2 film

Wei Kun Zhu, Kishor K. Kalathiparambil, Zhi Guang Sun, Chen Yang Liu, Ai Min Zhu, David N. Ruzic

Research output: Contribution to journalArticlepeer-review

Abstract

To improve the photocatalytic activity of TiO2 film, Ti substrates are irradiated by He ions with different incident ion energy, temperature, and fluence. Anatase TiO2 films are then coated on the plasma-irradiated substrates via chemical vapor deposition followed by calcination. Photocurrent tests and photocatalytic oxidation (PCO) of formaldehyde are used to assess photocatalytic performance. The optimal plasma-irradiated samples showed a four times higher photocurrent and a three fold increase in the rate constant of the PCO reaction compared to the TiO2 coated, untreated control sample. It is found that the enhanced photocatalytic activity and photocurrent are related to the changes of Ti crystal structure and surface morphology through plasma irradiation.

Original languageEnglish (US)
Article number1700223
JournalPlasma Processes and Polymers
Volume15
Issue number5
DOIs
StatePublished - May 2018

Keywords

  • Ti substrate
  • TiO film
  • ion bombardment
  • photocatalytic activity
  • plasma treatment

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Polymers and Plastics

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