@inproceedings{ede9395c421048aabbab17a4a37c030a,
title = "Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources",
abstract = "The Center for Plasma-Material Interactions has developed a detector capable of diagnosing the energetic ion and neutral spectrums emanating from extreme ultraviolet light sources. This tool has been used in the past for high-power output sources, but it is readily evident that actinic inspections tools require the use of debris mitigation analyzers. Using this tool, manufacturers can optimize the use of debris mitigation techniques, as well as analyze the effects brightness increases have on tool lifetime.",
keywords = "Actinic, Debris mitigation, EUV lithography",
author = "Daniel Andruczyk and John Sporre and Dan Elg and Tae Cho and Ruzic, {David N.}",
year = "2012",
doi = "10.1117/12.916437",
language = "English (US)",
isbn = "9780819489784",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Extreme Ultraviolet (EUV) Lithography III",
note = "Extreme Ultraviolet (EUV) Lithography III ; Conference date: 13-02-2012 Through 16-02-2012",
}