Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources

Daniel Andruczyk, John Sporre, Dan Elg, Tae Cho, David N Ruzic

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The Center for Plasma-Material Interactions has developed a detector capable of diagnosing the energetic ion and neutral spectrums emanating from extreme ultraviolet light sources. This tool has been used in the past for high-power output sources, but it is readily evident that actinic inspections tools require the use of debris mitigation analyzers. Using this tool, manufacturers can optimize the use of debris mitigation techniques, as well as analyze the effects brightness increases have on tool lifetime.

Original languageEnglish (US)
Title of host publicationExtreme Ultraviolet (EUV) Lithography III
DOIs
StatePublished - May 31 2012
EventExtreme Ultraviolet (EUV) Lithography III - San Jose, CA, United States
Duration: Feb 13 2012Feb 16 2012

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8322
ISSN (Print)0277-786X

Other

OtherExtreme Ultraviolet (EUV) Lithography III
CountryUnited States
CitySan Jose, CA
Period2/13/122/16/12

Fingerprint

Ultraviolet
ultraviolet radiation
Light sources
analyzers
light sources
Extremes
Ions
Energy
debris
Debris
ions
energy
Beam plasma interactions
Brightness
High Power
Inspection
inspection
Luminance
Lifetime
brightness

Keywords

  • Actinic
  • Debris mitigation
  • EUV lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Andruczyk, D., Sporre, J., Elg, D., Cho, T., & Ruzic, D. N. (2012). Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources. In Extreme Ultraviolet (EUV) Lithography III [832237] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8322). https://doi.org/10.1117/12.916437

Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources. / Andruczyk, Daniel; Sporre, John; Elg, Dan; Cho, Tae; Ruzic, David N.

Extreme Ultraviolet (EUV) Lithography III. 2012. 832237 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8322).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Andruczyk, D, Sporre, J, Elg, D, Cho, T & Ruzic, DN 2012, Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources. in Extreme Ultraviolet (EUV) Lithography III., 832237, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8322, Extreme Ultraviolet (EUV) Lithography III, San Jose, CA, United States, 2/13/12. https://doi.org/10.1117/12.916437
Andruczyk D, Sporre J, Elg D, Cho T, Ruzic DN. Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources. In Extreme Ultraviolet (EUV) Lithography III. 2012. 832237. (Proceedings of SPIE - The International Society for Optical Engineering). https://doi.org/10.1117/12.916437
Andruczyk, Daniel ; Sporre, John ; Elg, Dan ; Cho, Tae ; Ruzic, David N. / Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources. Extreme Ultraviolet (EUV) Lithography III. 2012. (Proceedings of SPIE - The International Society for Optical Engineering).
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