Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources

Daniel Andruczyk, John Sporre, Dan Elg, Tae Cho, David N. Ruzic

Research output: Chapter in Book/Report/Conference proceedingConference contribution


The Center for Plasma-Material Interactions has developed a detector capable of diagnosing the energetic ion and neutral spectrums emanating from extreme ultraviolet light sources. This tool has been used in the past for high-power output sources, but it is readily evident that actinic inspections tools require the use of debris mitigation analyzers. Using this tool, manufacturers can optimize the use of debris mitigation techniques, as well as analyze the effects brightness increases have on tool lifetime.

Original languageEnglish (US)
Title of host publicationExtreme Ultraviolet (EUV) Lithography III
StatePublished - May 31 2012
EventExtreme Ultraviolet (EUV) Lithography III - San Jose, CA, United States
Duration: Feb 13 2012Feb 16 2012

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


OtherExtreme Ultraviolet (EUV) Lithography III
Country/TerritoryUnited States
CitySan Jose, CA


  • Actinic
  • Debris mitigation
  • EUV lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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