Elimination of the sidewall defects in Selective Epitaxial Growth (SEG) of silicon for a dielectric isolation technology

John M. Sherman, Gerold W. Neudeck, John P. Denton, Rashid Bashir, William W. Fultz

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'Elimination of the sidewall defects in Selective Epitaxial Growth (SEG) of silicon for a dielectric isolation technology'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds