Elimination of stress-induced curvature in thin-film structures

Keyphrases

• Amorphization 50%
• Analytical Model 50%
• Argon Ions 50%
• Contour Shape 50%
• Flat Surface 50%
• Free-standing Film 50%
• Ion Beam 100%
• Ion Beam Machining 50%
• Machining Method 50%
• Negative Curvature 50%
• Out-of-plane Deformation 50%
• Planarization 50%
• Positive Curvature 50%
• Prediction Method 50%
• Process-based 50%
• Silicon Structure 50%
• Stress-induced 100%
• Surface Curvature 50%
• Surface Micromachining 50%
• Thin Film Devices 50%
• Thin Film Structure 100%
• Thin Surface Layer 50%
• Through-thickness Normal Stress 50%

Engineering

• Analytical Model 25%
• Conducted Experiment 25%
• Experimental Observation 25%
• Flat Surface 25%
• Induced Stress 100%
• Microelectromechanical System 25%
• Planarization 25%
• Plane Deformation 25%
• Surface Layer 25%
• Thin Films 100%