Elemental silicon nanoparticle plating and method for the same

Adam D. Smith (Inventor), Munir H. Nayfeh (Inventor), Gennadiy Belomoin (Inventor), Taysir Nayfeh (Inventor)

Research output: Patent


According to the invention, silicon nanoparticles are applied to a substrate using an electrochemical plating processes, analogous to metal plating. An electrolysis tank of an aqueous or non-aqueous solution, such as alcohol, ether, or other solvents in which the particles are dissolved operates at a current flow between the electrodes. In applying silicon nanoparticles to a silicon, metal, or non-conducting substrate, a selective area plating may be accomplished by defining areas of different conductivity on the substrate. Silicon nanoparticle composite platings and stacked alternating material platings are also possible. The addition of metal ions into the silicon nanoparticle solution produces a composite material plating. Either composite silicon nanoparticle platings or pure silicon nanoparticle platings may be stacked with each other or with convention metal platings.
Original languageEnglish (US)
U.S. patent number6660152
Filing date11/15/01
StatePublished - Dec 9 2003


Dive into the research topics of 'Elemental silicon nanoparticle plating and method for the same'. Together they form a unique fingerprint.

Cite this