Abstract
We developed a procedure for the electrodeposition of fluorescent silicon nanomaterial from silicates on conducting substrates. The electrodeposion solution used is a solution of sodium metasilicon salts (Na2SiO 3) in HF/H2O2. When a positively biased platinum substrate is immersed in the bath, a current is drawn and a thin fluorescent coating is formed on the substrate. We discuss the results in terms of current-induced nucleation of silicon nanostructures.
Original language | English (US) |
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Article number | A8.10 |
Pages (from-to) | 301-305 |
Number of pages | 5 |
Journal | Materials Research Society Symposium Proceedings |
Volume | 862 |
DOIs | |
State | Published - 2005 |
Event | 2005 Materials Research Society Spring Meeting - San Francisco, CA, United States Duration: Mar 28 2005 → Apr 1 2005 |
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering