Electrode and condenser materials for plasma pinch sources

A. Hassanein, J. P. Allain, T. Burtseva, Z. Insepov, J. N. Brooks, I. Konkashbaev, V. Morozov, V. Sizyuk, V. Tolkach, T. Sizyuk, B. Rice, V. Safronov, V. Bakshi

Research output: Chapter in Book/Report/Conference proceedingChapter

Original languageEnglish (US)
Title of host publicationEUV Sources for Lithography
PublisherSPIE
Pages915-956
Number of pages42
ISBN (Electronic)9780819480712
ISBN (Print)0819458457, 9780819458452
DOIs
StatePublished - Feb 23 2006
Externally publishedYes

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Plasmas
Electrodes

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Hassanein, A., Allain, J. P., Burtseva, T., Insepov, Z., Brooks, J. N., Konkashbaev, I., ... Bakshi, V. (2006). Electrode and condenser materials for plasma pinch sources. In EUV Sources for Lithography (pp. 915-956). SPIE. DOI: 10.1117/3.613774.Ch35

Electrode and condenser materials for plasma pinch sources. / Hassanein, A.; Allain, J. P.; Burtseva, T.; Insepov, Z.; Brooks, J. N.; Konkashbaev, I.; Morozov, V.; Sizyuk, V.; Tolkach, V.; Sizyuk, T.; Rice, B.; Safronov, V.; Bakshi, V.

EUV Sources for Lithography. SPIE, 2006. p. 915-956.

Research output: Chapter in Book/Report/Conference proceedingChapter

Hassanein, A, Allain, JP, Burtseva, T, Insepov, Z, Brooks, JN, Konkashbaev, I, Morozov, V, Sizyuk, V, Tolkach, V, Sizyuk, T, Rice, B, Safronov, V & Bakshi, V 2006, Electrode and condenser materials for plasma pinch sources. in EUV Sources for Lithography. SPIE, pp. 915-956. DOI: 10.1117/3.613774.Ch35
Hassanein A, Allain JP, Burtseva T, Insepov Z, Brooks JN, Konkashbaev I et al. Electrode and condenser materials for plasma pinch sources. In EUV Sources for Lithography. SPIE. 2006. p. 915-956. Available from, DOI: 10.1117/3.613774.Ch35

Hassanein, A.; Allain, J. P.; Burtseva, T.; Insepov, Z.; Brooks, J. N.; Konkashbaev, I.; Morozov, V.; Sizyuk, V.; Tolkach, V.; Sizyuk, T.; Rice, B.; Safronov, V.; Bakshi, V. / Electrode and condenser materials for plasma pinch sources.

EUV Sources for Lithography. SPIE, 2006. p. 915-956.

Research output: Chapter in Book/Report/Conference proceedingChapter

@inbook{0ee52a4f2e304979be3265ee6f0c95d8,
title = "Electrode and condenser materials for plasma pinch sources",
author = "A. Hassanein and Allain, {J. P.} and T. Burtseva and Z. Insepov and Brooks, {J. N.} and I. Konkashbaev and V. Morozov and V. Sizyuk and V. Tolkach and T. Sizyuk and B. Rice and V. Safronov and V. Bakshi",
year = "2006",
month = "2",
doi = "10.1117/3.613774.Ch35",
isbn = "0819458457",
pages = "915--956",
booktitle = "EUV Sources for Lithography",
publisher = "SPIE",
address = "United States",

}

TY - CHAP

T1 - Electrode and condenser materials for plasma pinch sources

AU - Hassanein,A.

AU - Allain,J. P.

AU - Burtseva,T.

AU - Insepov,Z.

AU - Brooks,J. N.

AU - Konkashbaev,I.

AU - Morozov,V.

AU - Sizyuk,V.

AU - Tolkach,V.

AU - Sizyuk,T.

AU - Rice,B.

AU - Safronov,V.

AU - Bakshi,V.

PY - 2006/2/23

Y1 - 2006/2/23

UR - http://www.scopus.com/inward/record.url?scp=84960233294&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84960233294&partnerID=8YFLogxK

U2 - 10.1117/3.613774.Ch35

DO - 10.1117/3.613774.Ch35

M3 - Chapter

SN - 0819458457

SN - 9780819458452

SP - 915

EP - 956

BT - EUV Sources for Lithography

PB - SPIE

ER -