Electrochemical nanoimprinting of silicon

Aliaksandr Sharstniou, Stanislau Niauzorau, Placid Mathew Ferreira, Bruno P. Azeredo

Research output: Contribution to journalArticle

Abstract

Scalable nanomanufacturing enables the commercialization of nanotechnology, particularly in applications such as nanophotonics, silicon photonics, photovoltaics, and biosensing. Nanoimprinting lithography (NIL) was the first scalable process to introduce 3D nanopatterning of polymeric films. Despite efforts to extend NIL's library of patternable media, imprinting of inorganic semiconductors has been plagued by concomitant generation of crystallography defects during imprinting. Here, we use an electrochemical nanoimprinting process-called Mac-Imprint-for directly patterning electronic-grade silicon with 3D microscale features. It is shown that stamps made of mesoporous metal catalysts allow for imprinting electronic-grade silicon without the concomitant generation of porous silicon damage while introducing mesoscale roughness. Unlike most NIL processes, Mac-Imprint does not rely on plastic deformation, and thus, it allows for replicating hard and brittle materials, such as silicon, from a reusable polymeric mold, which can be manufactured by almost any existing microfabrication technique.

Original languageEnglish (US)
Pages (from-to)10264-10269
Number of pages6
JournalProceedings of the National Academy of Sciences of the United States of America
Volume116
Issue number21
DOIs
StatePublished - Jan 1 2019

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Silicon
Optics and Photonics
Microtechnology
Semiconductors
Crystallography
Nanotechnology
Plastics
Libraries
Fungi
Metals

Keywords

  • 3D silicon micromachining
  • metal-assisted chemical etching
  • microfabrication
  • nanoimprinting
  • silicon photonics

ASJC Scopus subject areas

  • General

Cite this

Electrochemical nanoimprinting of silicon. / Sharstniou, Aliaksandr; Niauzorau, Stanislau; Ferreira, Placid Mathew; Azeredo, Bruno P.

In: Proceedings of the National Academy of Sciences of the United States of America, Vol. 116, No. 21, 01.01.2019, p. 10264-10269.

Research output: Contribution to journalArticle

Sharstniou, Aliaksandr ; Niauzorau, Stanislau ; Ferreira, Placid Mathew ; Azeredo, Bruno P. / Electrochemical nanoimprinting of silicon. In: Proceedings of the National Academy of Sciences of the United States of America. 2019 ; Vol. 116, No. 21. pp. 10264-10269.
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