Electrochemical imprinting of micro- and nano-structures in porous silicon, silicon, and other semiconductors

Keng Hao Hsu; Placid M Ferreira; Bruno Azeredo

Electrochemical imprinting of micro- and nano-structures in porous silicon, silicon, and other semiconductors

Keng Hao Hsu (Inventor)
, Placid M Ferreira (Inventor)
, Bruno Azeredo (Inventor)

Research output: Patent

Abstract

An imprinting platform including a noble metal catalyst, a semiconductor substrate, and a pre-patterned polymer stamp, where the catalyst is attached to the stamp, and related methods and articles.

Original language	English (US)
U.S. patent number	11579524
Filing date	11/3/21
State	Published - Feb 14 2023

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title = "Electrochemical imprinting of micro- and nano-structures in porous silicon, silicon, and other semiconductors",

abstract = "An imprinting platform including a noble metal catalyst, a semiconductor substrate, and a pre-patterned polymer stamp, where the catalyst is attached to the stamp, and related methods and articles.",

author = "Hsu, \{Keng Hao\} and Ferreira, \{Placid M\} and Bruno Azeredo",

note = "STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH This invention was made with government support under grant number 1200780, awarded by the National Science Foundation. The government has certain rights in the invention.; 11579524",

year = "2023",

month = feb,

day = "14",

language = "English (US)",

type = "Patent",

}

TY - PAT

T1 - Electrochemical imprinting of micro- and nano-structures in porous silicon, silicon, and other semiconductors

AU - Hsu, Keng Hao

AU - Ferreira, Placid M

AU - Azeredo, Bruno

N1 - STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH This invention was made with government support under grant number 1200780, awarded by the National Science Foundation. The government has certain rights in the invention.

PY - 2023/2/14

Y1 - 2023/2/14

N2 - An imprinting platform including a noble metal catalyst, a semiconductor substrate, and a pre-patterned polymer stamp, where the catalyst is attached to the stamp, and related methods and articles.

AB - An imprinting platform including a noble metal catalyst, a semiconductor substrate, and a pre-patterned polymer stamp, where the catalyst is attached to the stamp, and related methods and articles.

M3 - Patent

M1 - 11579524

Y2 - 2021/11/03

ER -

Electrochemical imprinting of micro- and nano-structures in porous silicon, silicon, and other semiconductors

Abstract

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