Elastocapillary Force Induced Alignment of Large Area Planar Nanowires

Kyooho Jung, Wonsik Choi, Hsien Chih Huang, Jeong Dong Kim, Kelson Chabak, Xiuling Li

Research output: Contribution to journalArticlepeer-review

Abstract

Achieving large scale precise positioning of the vapor-liquid-solid (VLS) nanowires is one of the biggest challenges for mass production of nanowire-based devices. Although there have been many noteworthy progresses in postgrowth nanowire alignment method development over the past few decades, these methods are mostly suitable for low density applications only. For high density applications such as transistors, both high yield and density are required. Here, we report an elastocapillary force-induced nanowire-aligning method that is extremely simple, clean, and can achieve single/multiple nanowire arrays with up to 98.8% yield and submicron pitch between the nanowires.

Original languageEnglish (US)
Pages (from-to)11177-11184
Number of pages8
JournalACS Applied Materials and Interfaces
Volume13
Issue number9
DOIs
StatePublished - Mar 10 2021

Keywords

  • GaAs
  • InAs
  • alignment
  • elastocapillary force
  • nanowire
  • planar nanowire

ASJC Scopus subject areas

  • Materials Science(all)

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