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Effects of synchrotron x-rays on PVD deposited and ion implanted α-Si
Kin Man Yu
, Lei Wang
, W. Walukiewicz
, S. Muto
, S. McCormick
,
J. R. Abelson
Research output
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Contribution to journal
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›
peer-review
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Keyphrases
Crystallization Process
100%
Irradiation
100%
Heavy Ions
100%
Ion Implantation
100%
Synchrotron X-ray
100%
PVD Films
100%
Crystalline Materials
50%
Bond Length
50%
Thermal Annealing
50%
Amorphous Films
50%
Amorphous Si Film
50%
Raman Spectroscopy
50%
Coordination number
50%
Extended X-ray Absorption Fine Structure (EXAFS)
50%
Nucleation Centers
50%
Total Dose
50%
Crystallites
50%
Local Structure
50%
Physical Vapor Deposition
50%
Amorphous Layer
50%
Residual Amount
50%
Solid Phase Epitaxy
50%
EXELFS
50%
Physics
Synchrotron
100%
Crystallization
100%
Raman Spectroscopy
50%
Epitaxy
50%
Nucleation
50%
Crystallite
50%
Crystalline Material
50%
Vapor Deposition
50%
Material Science
Film
100%
Physical Vapor Deposition
100%
Crystallization
33%
Annealing
16%
Amorphous Film
16%
Nucleation
16%
Raman Spectroscopy
16%
Extended X-Ray Absorption Fine Structure
16%
Solid Phase Epitaxy
16%
Crystalline Material
16%
Crystallite
16%