Effects of organic and metal contamination on the etch rate of acid baths - Implications for extended acid use

Andre Ellis, Jennifer Deluhery, Nandakishore Rajagopalan

Research output: Contribution to specialist publicationArticle

Abstract

Appreciable quantities of hazardous acid wastes are generated during electroplating operations. These acids are typically disposed of when their etching rates have dropped below some critical threshold. It has often been assumed that the acid etch rates are primarily limited by the build-up in metals concentration. In this paper, we demonstrate that acid etch rates are highly sensitive to the presence of organic/ colloidal impurities. Consequently, the removal of such impurities by soluble silicates, ultrafiltration or carbon adsorption improves the etch rates of acids even in the presence of substantial metal contamination.

Original languageEnglish (US)
Pages42-47
Number of pages6
Specialist publicationPlating and Surface Finishing
StatePublished - Feb 2005

Fingerprint

acids
Acids
metals
Metals
contamination
impurities
Contamination
Impurities
Berkelium
Acridine Orange
electroplating
baths
silicates
removal
etching
adsorption
thresholds
carbon
Electroplating
Ultrafiltration

ASJC Scopus subject areas

  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Effects of organic and metal contamination on the etch rate of acid baths - Implications for extended acid use. / Ellis, Andre; Deluhery, Jennifer; Rajagopalan, Nandakishore.

In: Plating and Surface Finishing. 2005 ; 92, 2, p. 42-47.

Research output: Contribution to specialist publicationArticle

Ellis, Andre; Deluhery, Jennifer; Rajagopalan, Nandakishore / Effects of organic and metal contamination on the etch rate of acid baths - Implications for extended acid use.

In: Plating and Surface Finishing. 2005 ; 92, 2, p. 42-47.

Research output: Contribution to specialist publicationArticle

@misc{c66a799222104e0a875aaba9546dfebc,
title = "Effects of organic and metal contamination on the etch rate of acid baths - Implications for extended acid use",
abstract = "Appreciable quantities of hazardous acid wastes are generated during electroplating operations. These acids are typically disposed of when their etching rates have dropped below some critical threshold. It has often been assumed that the acid etch rates are primarily limited by the build-up in metals concentration. In this paper, we demonstrate that acid etch rates are highly sensitive to the presence of organic/ colloidal impurities. Consequently, the removal of such impurities by soluble silicates, ultrafiltration or carbon adsorption improves the etch rates of acids even in the presence of substantial metal contamination.",
author = "Andre Ellis and Jennifer Deluhery and Nandakishore Rajagopalan",
year = "2005",
month = "2",
volume = "92",
pages = "42--47",
journal = "Plating and Surface Finishing",
issn = "0360-3164",
publisher = "American Electroplaters and Surface Finishers Soc. Inc.",

}

TY - GEN

T1 - Effects of organic and metal contamination on the etch rate of acid baths - Implications for extended acid use

AU - Ellis,Andre

AU - Deluhery,Jennifer

AU - Rajagopalan,Nandakishore

PY - 2005/2

Y1 - 2005/2

N2 - Appreciable quantities of hazardous acid wastes are generated during electroplating operations. These acids are typically disposed of when their etching rates have dropped below some critical threshold. It has often been assumed that the acid etch rates are primarily limited by the build-up in metals concentration. In this paper, we demonstrate that acid etch rates are highly sensitive to the presence of organic/ colloidal impurities. Consequently, the removal of such impurities by soluble silicates, ultrafiltration or carbon adsorption improves the etch rates of acids even in the presence of substantial metal contamination.

AB - Appreciable quantities of hazardous acid wastes are generated during electroplating operations. These acids are typically disposed of when their etching rates have dropped below some critical threshold. It has often been assumed that the acid etch rates are primarily limited by the build-up in metals concentration. In this paper, we demonstrate that acid etch rates are highly sensitive to the presence of organic/ colloidal impurities. Consequently, the removal of such impurities by soluble silicates, ultrafiltration or carbon adsorption improves the etch rates of acids even in the presence of substantial metal contamination.

UR - http://www.scopus.com/inward/record.url?scp=17644412016&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=17644412016&partnerID=8YFLogxK

M3 - Article

VL - 92

SP - 42

EP - 47

JO - Plating and Surface Finishing

T2 - Plating and Surface Finishing

JF - Plating and Surface Finishing

SN - 0360-3164

ER -