Effects of nitrogen doping on optical properties of TiO2 thin films

P. G. Wu, C. H. Ma, J. K. Shang

Research output: Contribution to journalArticlepeer-review


The potential for extending the optical absorption range of TiO2 by doping with nonmetallic elements was examined in nitrogen-containing TiO2 thin films. Thin films of TiO2-xNx were synthesized on glass and silicon substrates by ion-beam-assisted deposition to obtain a wide range of nitrogen concentrations. The compositions of the films were determined by Rutherford backscattering spectrometry and X-ray photoelectron spectroscopy. The structures of the films were analyzed by X-ray diffraction, transmission electron microscopy, and atomic force microscopy. The optical properties of the films were measured by UV-Vis spectroscopy and ellipsometry. A characteristic decreasing trend in band-gap values of the films was observed within a certain range of increasing dopant concentrations. As the nitrogen concentration increased, the structure of the films evolved from a well-defined anatase to deformed anatase. The reduced band gaps are associated with the N 2p orbital in the TiO2-xNx films.

Original languageEnglish (US)
Pages (from-to)1411-1417
Number of pages7
JournalApplied Physics A: Materials Science and Processing
Issue number7
StatePublished - Nov 2005
Externally publishedYes

ASJC Scopus subject areas

  • General Chemistry
  • General Materials Science


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