Effects of conductor losses on cross-talk in multilevel coupled VLSI interconnections

T. E. Van Deventer, P. B. Katehi, A. C. Cangellaris

Research output: Contribution to journalConference articlepeer-review


The influence of conductor losses on the cross-talk between coupled microstrip lines is evaluated using an integral equation method. In this mathematical formulation, the fields are computed inside the conductors and are utilized to define an equivalent impedance on the surface of the strips. This surface impedance is used as a boundary condition for the solution of the electromagnetic problem outside the conductors. Following this procedure the effect of losses on pulse dispersion in coupled microstrip lines is studied thoroughly for various geometries.

Original languageEnglish (US)
Pages (from-to)285-296
Number of pages12
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - Apr 1 1991
Externally publishedYes
EventMicroelectronic Interconnects and Packages: Optical and Electrical Technologies 1990 - Boston, United States
Duration: Nov 4 1990Nov 9 1990

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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