Effective decomposition algorithm for self-aligned double patterning lithography

Hongbo Zhang, Yuelin Du, Martin D F Wong, Rasit Topaloglu, Will Conley

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Self-aligned double patterning (SADP) lithography is a novel lithography technology that has the intrinsic capability to reduce the overlay in the double patterning lithography (DPL). Although SADP is the critical technology to solve the lithography difficulties in sub-32nm 2D design, the problems of how to decompose a layout with reasonable overlay and how to perform a decomposability check remain open with no published work. In this paper, by formulating the problem into a SAT formation, we can solve the above two problems optimally. This is the first published paper with a detailed algorithm to perform the SADP decomposition. In a layout, we can efficiently check whether a layout is decomposable. For a decomposable layout, our algorithm guarantees to find a decomposition solution with reasonable overlay reduction requirement. With little changes on the clauses in the SAT formula, we can address the decomposition problem for both the positive tone process and the negative tone process. Experimental results validate our method, and decomposition results for Nangate Open Cell Library and larger test cases are also provided with competitive run times.

Original languageEnglish (US)
Title of host publicationOptical Microlithography XXIV
Volume7973
DOIs
StatePublished - Jun 22 2011
EventOptical Microlithography XXIV - San Jose, CA, United States
Duration: Mar 1 2011Mar 3 2011

Other

OtherOptical Microlithography XXIV
CountryUnited States
CitySan Jose, CA
Period3/1/113/3/11

Fingerprint

Double Patterning
Decomposition Algorithm
Lithography
layouts
Layout
lithography
Overlay
Decomposition
decomposition
Decompose
Decomposable
Problem Decomposition
Decomposability
requirements
Requirements
Cell
Experimental Results
cells

Keywords

  • Decomposability check
  • Negative tone process
  • Overlay reduction
  • Positive tone process
  • Sadp decomposition
  • Sat

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Zhang, H., Du, Y., Wong, M. D. F., Topaloglu, R., & Conley, W. (2011). Effective decomposition algorithm for self-aligned double patterning lithography. In Optical Microlithography XXIV (Vol. 7973). [79730J] https://doi.org/10.1117/12.879324

Effective decomposition algorithm for self-aligned double patterning lithography. / Zhang, Hongbo; Du, Yuelin; Wong, Martin D F; Topaloglu, Rasit; Conley, Will.

Optical Microlithography XXIV. Vol. 7973 2011. 79730J.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zhang, H, Du, Y, Wong, MDF, Topaloglu, R & Conley, W 2011, Effective decomposition algorithm for self-aligned double patterning lithography. in Optical Microlithography XXIV. vol. 7973, 79730J, Optical Microlithography XXIV, San Jose, CA, United States, 3/1/11. https://doi.org/10.1117/12.879324
Zhang H, Du Y, Wong MDF, Topaloglu R, Conley W. Effective decomposition algorithm for self-aligned double patterning lithography. In Optical Microlithography XXIV. Vol. 7973. 2011. 79730J https://doi.org/10.1117/12.879324
Zhang, Hongbo ; Du, Yuelin ; Wong, Martin D F ; Topaloglu, Rasit ; Conley, Will. / Effective decomposition algorithm for self-aligned double patterning lithography. Optical Microlithography XXIV. Vol. 7973 2011.
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