Effect of embedded microcrystallites on the light-induced degradation of hydrogenated amorphous silicon

Yoram Lubianiker, J. David Cohen, Hyun Chul Jin, John R. Abelson

Research output: Contribution to journalArticle

Abstract

We have studied the degradation kinetics of undoped hydrogenated amorphous silicon (a-Si:H) samples, in which a small fraction of microcrystallites is embedded. We find that the defect density increases with an unusually slow initial pace, which is then followed by the “normal” t1/3 law and the subsequent saturation. The corresponding photoconductivity shows a remarkable initial stability. We present a model that reproduces the experimental results, and relates the structural and degradation anomalies. The measured defect density is interpreted as a superposition of contributions from a defective layer that wraps the microcrystallites and a high-quality amorphous matrix.

Original languageEnglish (US)
Pages (from-to)4434-4437
Number of pages4
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume60
Issue number7
DOIs
StatePublished - Jan 1 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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