Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points

F. Horst, William M.J. Green, B. J. Offrein, Yurii Vlasov

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present ultra-compact integrated optical echelle grating WDM (de-)multiplexers for on-chip optical networks. These devices are based on a design with two stigmatic points. The devices were fabricated using Silicon-On-Insulator (SOI) photonic waveguide technology thus the smallest version of the (de-)multiplexer occupies an area of only 250x200 μm. We will show measurement results on different variations of the echelle grating devices. In the measurements, we found a channel to channel isolation of 19 dB. The minimum insertion loss, relative to a straight waveguide, is only 3 dB with a channel to channel variation of 0.5 dB.

Original languageEnglish (US)
Title of host publicationSilicon Photonics and Photonic Integrated Circuits
DOIs
StatePublished - Sep 2 2008
Externally publishedYes
EventSilicon Photonics and Photonic Integrated Circuits - Strasbourg, France
Duration: Apr 7 2008Apr 10 2008

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6996
ISSN (Print)0277-786X

Other

OtherSilicon Photonics and Photonic Integrated Circuits
CountryFrance
CityStrasbourg
Period4/7/084/10/08

Keywords

  • Demultiplexer
  • Echelle
  • Grating
  • Optical
  • SOI
  • Silicon on Insulator
  • WDM

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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