@inproceedings{4210808efedd4d1ab757ac6c9c15c43e,
title = "Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points",
abstract = "We present ultra-compact integrated optical echelle grating WDM (de-)multiplexers for on-chip optical networks. These devices are based on a design with two stigmatic points. The devices were fabricated using Silicon-On-Insulator (SOI) photonic waveguide technology thus the smallest version of the (de-)multiplexer occupies an area of only 250x200 μm. We will show measurement results on different variations of the echelle grating devices. In the measurements, we found a channel to channel isolation of 19 dB. The minimum insertion loss, relative to a straight waveguide, is only 3 dB with a channel to channel variation of 0.5 dB.",
keywords = "Demultiplexer, Echelle, Grating, Optical, SOI, Silicon on Insulator, WDM",
author = "F. Horst and Green, {William M.J.} and Offrein, {B. J.} and Yurii Vlasov",
year = "2008",
month = sep,
day = "2",
doi = "10.1117/12.781232",
language = "English (US)",
isbn = "9780819471949",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Silicon Photonics and Photonic Integrated Circuits",
note = "Silicon Photonics and Photonic Integrated Circuits ; Conference date: 07-04-2008 Through 10-04-2008",
}