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Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals

  • Daniel J. Shir
  • , Erik C. Nelson
  • , Debashis Chanda
  • , Andrew Brzezinski
  • , Paul V. Braun
  • , John A. Rogers
  • , Pierre Wiltzius

Research output: Contribution to journal › Article › peer-review

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