@inproceedings{b7bc9d10d3e141d89c9d30d4d5563955,
title = "DSA template mask d{\'e}termination and cut redistribution for advanced 1D gridded design",
abstract = "Directed self-assembly (DSA) technology has already demonstrated its capability for isolated and grouped contact/via pattern for 1D gridded design. If we reverse the resist tune, this technique can also be used to implement the cut printing. However, for this purpose, we need to redistribute the cuts by extending the real wires to form the desired cut distribution for template mask making. Based on this assumption, we propose an algorithm to redistribute the original cuts such that they form groups of non-conflict DSA templates. Exp{\'e}rimental results demonstrate that our method can effectively redistribute the cuts and improve the layout manufacturability.",
keywords = "DSA, Directed self-assembly, algorithm, cut redistribution, template",
author = "Zigang Xiao and Yuelin Du and Wong, {Martin D.F.} and Hongbo Zhang",
year = "2013",
doi = "10.1117/12.2025688",
language = "English (US)",
isbn = "9780819495457",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Photomask Technology 2013",
note = "SPIE Conference on Photomask Technology 2013 ; Conference date: 10-09-2013 Through 12-09-2013",
}