DSA template mask détermination and cut redistribution for advanced 1D gridded design

Zigang Xiao, Yuelin Du, Martin D F Wong, Hongbo Zhang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Directed self-assembly (DSA) technology has already demonstrated its capability for isolated and grouped contact/via pattern for 1D gridded design. If we reverse the resist tune, this technique can also be used to implement the cut printing. However, for this purpose, we need to redistribute the cuts by extending the real wires to form the desired cut distribution for template mask making. Based on this assumption, we propose an algorithm to redistribute the original cuts such that they form groups of non-conflict DSA templates. Expérimental results demonstrate that our method can effectively redistribute the cuts and improve the layout manufacturability.

Original languageEnglish (US)
Title of host publicationPhotomask Technology 2013
DOIs
StatePublished - Dec 12 2013
EventSPIE Conference on Photomask Technology 2013 - Monterey, CA, United States
Duration: Sep 10 2013Sep 12 2013

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8880
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherSPIE Conference on Photomask Technology 2013
CountryUnited States
CityMonterey, CA
Period9/10/139/12/13

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Keywords

  • DSA
  • Directed self-assembly
  • algorithm
  • cut redistribution
  • template

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Xiao, Z., Du, Y., Wong, M. D. F., & Zhang, H. (2013). DSA template mask détermination and cut redistribution for advanced 1D gridded design. In Photomask Technology 2013 [888017] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8880). https://doi.org/10.1117/12.2025688