Dry etching of GaN using chemically assisted ion beam etching with HCl and H2/Cl2

A. T. Ping, A. C. Schmitz, M. Asif Khan, I. Adesida

Research output: Contribution to journalArticlepeer-review

Fingerprint

Dive into the research topics of 'Dry etching of GaN using chemically assisted ion beam etching with HCl and H2/Cl2'. Together they form a unique fingerprint.

Engineering

Keyphrases

Material Science