Dry Etching for Submicron Structures

E. D. Wolf; I. Adesida; J. D. Chinn

doi:10.1116/1.572367

Dry Etching for Submicron Structures

E. D. Wolf, I. Adesida, J. D. Chinn

Research output: Contribution to journal › Article › peer-review

Abstract

Various drying etching techniques are briefly reviewed and application of some of these techniques for the fabrication of small structures in electronic and metallic materials are discussed. Experimental results from reactive ion etching, reactive ion beam etching, and chemically assisted ion beam etching will be shown for a number of substrate/etch mask systems at dimensions well below 1 fim linewidths.

Original language	English (US)
Pages (from-to)	464-469
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	2
Issue number	2
DOIs	https://doi.org/10.1116/1.572367
State	Published - Apr 1984
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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abstract = "Various drying etching techniques are briefly reviewed and application of some of these techniques for the fabrication of small structures in electronic and metallic materials are discussed. Experimental results from reactive ion etching, reactive ion beam etching, and chemically assisted ion beam etching will be shown for a number of substrate/etch mask systems at dimensions well below 1 fim linewidths.",

author = "Wolf, {E. D.} and I. Adesida and Chinn, {J. D.}",

year = "1984",

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language = "English (US)",

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AU - Adesida, I.

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Dry Etching for Submicron Structures

Abstract

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