Dry Etching for Submicron Structures

E. D. Wolf, I. Adesida, J. D. Chinn

Research output: Contribution to journalArticlepeer-review


Various drying etching techniques are briefly reviewed and application of some of these techniques for the fabrication of small structures in electronic and metallic materials are discussed. Experimental results from reactive ion etching, reactive ion beam etching, and chemically assisted ion beam etching will be shown for a number of substrate/etch mask systems at dimensions well below 1 fim linewidths.

Original languageEnglish (US)
Pages (from-to)464-469
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number2
StatePublished - Apr 1984
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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