DOUBLE-SIDED PHOTOLITHOGRAPHY.

Robert A. Heinz, John T. Chuss, Charles M. Schroeder

Research output: Contribution to specialist publicationArticle

Abstract

A new technique for generating registered patterns on opposite sides of a substrate has been developed. Rather than introducing the patterns sequentially and registering them with an infrared or dual viewing microscope, the photomasks for the two surfaces are pre-aligned and assembled into a hinged configuration referred to as an alligator mask. Substrates can then be inserted into the alligator mask and exposed on both sides without on-line alignment. Since a registered set of exposed patterns now exists, subsequent processing can be performed simultaneously on both surfaces.

Original languageEnglish (US)
Pages55-60
Number of pages6
Volume21
No8
Specialist publicationSolid State Technology
StatePublished - 1978
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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