Dissolvable Template Nanoimprint Lithography: A Facile and Versatile Nanoscale Replication Technique

Junho Oh, Jacob B. Hoffman, Sungmin Hong, Kyoo D. Jo, Jessica Román-Kustas, Julian H. Reed, Catherine E. Dana, Donald M. Cropek, Marianne Alleyne, Nenad Miljkovic

Research output: Contribution to journalArticlepeer-review

Abstract

Nanoimprinting lithography (NIL) is a next-generation nanofabrication method, capable of replicating nanostructures from original master surfaces. Here, we develop highly scalable, simple, and nondestructive NIL using a dissolvable template. Termed dissolvable template nanoimprinting lithography (DT-NIL), our method utilizes an economic thermoplastic resin to fabricate nanoimprinting templates, which can be easily dissolved in simple organic solvents. We used the DT-NIL method to replicate cicada wings which have surface nanofeatures of ∼100 nm in height. The master, template, and replica surfaces showed a >∼94% similarity based on the measured diameter and height of the nanofeatures. The versatility of DT-NIL was also demonstrated with the replication of re-entrant, multiscale, and hierarchical features on fly wings, as well as hard silicon wafer-based artificial nanostructures. The DT-NIL method can be performed under ambient conditions with inexpensive materials and equipment. Our work opens the door to opportunities for economical and high-throughput nanofabrication processes.

Original languageEnglish (US)
Pages (from-to)6989-6997
Number of pages9
JournalNano letters
Volume20
Issue number10
DOIs
StatePublished - Oct 14 2020

Keywords

  • Nanoimprinting
  • nanomanufacturing
  • nanostructures
  • insect wing
  • template

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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