Direct writing via electron-driven reactions

Seung Whan Lee, R. Mohan Sankaran

Research output: Contribution to journalReview articlepeer-review


Direct writing has recently emerged as a viable alternative to lithography for the fabrication of patterned metallic and semiconducting materials. State-of-the-art tools such as scanning electron beams and scanning probe microscopy have been implemented in direct-write strategies to produce arbitrary and complex patterns in fewer steps, with resolution capabilities as good or better than lithographic approaches. A common thread among many of the strategies is electron-driven chemistry. Here, we review this special class of direct-write techniques, highlighting advances, challenges, and future prospects.

Original languageEnglish (US)
Pages (from-to)117-122
Number of pages6
JournalMaterials Today
Issue number4
StatePublished - Apr 2013
Externally publishedYes

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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