Direct writing of sub-5 nm hafnium diboride metallic nanostructures

Wei Ye, Pamela A. Peña Martin, Navneet Kumar, Scott R. Daly, Angus Rockett, John R. Abelson, Gregory S. Girolami, Joseph W. Lyding

Research output: Contribution to journalArticlepeer-review


Sub-5 nm metallic hafnium diboride (HfB2) nanostructures were directly written onto Si(100)-2×1:H surfaces using ultrahigh vacuum scanning tunneling microscope (UHV-STM) electron beam induced deposition (EBID) of a carbon-free precursor molecule, tetrakis(tetrahydroborato)hafnium, Hf(BH4)4. Scanning tunneling spectroscopy data confirm the metallic nature of the HfB2 nanostructures, which have been written down to lateral dimensions of ∼2.5 nm. To our knowledge, this is the first demonstration of sub-5 nm metallic nanostructures in an STM-EBID experiment.

Original languageEnglish (US)
Pages (from-to)6818-6824
Number of pages7
JournalACS Nano
Issue number11
StatePublished - Nov 23 2010


  • Electron beam induced deposition
  • Hafnium diboride
  • Nanodot
  • Nanowire
  • Scanning tunneling microscopy
  • Scanning tunneling spectroscopy
  • Sub-5 nm

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)
  • Physics and Astronomy(all)


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