Abstract

Polymer nanostructures were directly written onto substrates in ultra-high vacuum. The polymer ink was coated onto atomic force microscope (AFM) probes that could be heated to control the ink viscosity. Then, the ink-coated probes were placed into an ultrahigh vacuum (UHV) AFM and used to write polymer nanostructures on surfaces, including surfaces cleaned in UHV. Controlling the writing speed of the tip enabled the control over the number of monolayers of the polymer ink deposited on the surface from a single to tens of monolayers, with higher writing speeds generating thinner polymer nanostructures. Deposition onto silicon oxideterminated substrates led to polymer chains standing upright on the surface, whereas deposition onto vacuum reconstructed silicon yielded polymer chains aligned along the surface.

Original languageEnglish (US)
Pages (from-to)52-56
Number of pages5
JournalBeilstein Journal of Nanotechnology
Volume3
Issue number1
DOIs
StatePublished - 2012

Keywords

  • Additive lithography
  • Polymer
  • Scanning probe lithography
  • Ultra high vacuum

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy(all)
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Direct-write polymer nanolithography in ultra-high vacuum'. Together they form a unique fingerprint.

  • Cite this

    Lee, W. K., Yang, M., Laracuente, A. R., King, W. P., Whitman, L. J., & Sheehan, P. E. (2012). Direct-write polymer nanolithography in ultra-high vacuum. Beilstein Journal of Nanotechnology, 3(1), 52-56. https://doi.org/10.3762/bjnano.3.6