@inproceedings{3bb24b66112a4f9cbc60d5e82951b586,
title = "Direct simulation Monte Carlo modeling of ionized metal physical vapor deposition for semiconductor processing",
author = "Hao Deng and Takashi Ozawa and Deborah Levin and Kushner, {Mark J.} and Larry Gochberg",
year = "2009",
doi = "10.1109/PLASMA.2009.5227277",
language = "English (US)",
isbn = "9781424426188",
series = "IEEE International Conference on Plasma Science",
booktitle = "2009 IEEE International Conference on Plasma Science - Abstracts, ICOPS 2009",
note = "2009 IEEE International Conference on Plasma Science - Abstracts, ICOPS 2009 ; Conference date: 01-06-2009 Through 05-06-2009",
}