Direct integration of single-walled carbon nanotubes with silicon

P. M. Albrecht, R. M. Farrell, W. Ye, J. W. Lyding

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have used ultrahigh vacuum scanning tunneling microscopy (UHV STM) to study single-walled carbon nanotubes (SWNTs) supported by a hydrogen-terminated Si(100)-2×1 surface. Two distinct methods were used in the deposition of SWNTs. The first is an ex situ solution-based scheme, while the second involves direct mechanical transfer in situ. The UHV-prepared Si(100)-2×1:H surface is highly robust to ambient exposure, resulting in minimal surface degradation associated with ex situ chemical processing. We have achieved simultaneous atomic resolution STM images of SWNTs and the nearby silicon substrate. Local electronic characterization was performed using scanning tunneling spectroscopy (STS). I-V spectra depict a shift in the Fermi energy of semiconducting SWNTs towards the valence band edge, consistent with charge transfer between the nanotube and the silicon substrate. A metallic SWNT shows an approximately linear I-V response at low bias, while the surrounding Si(100)-2×1:H substrate shows a ∼1.3 eV gap. An advanced understanding of the fundamental physical and electronic interactions between carbon nanotubes and silicon will further the development of hybrid nanoscale devices and circuits.

Original languageEnglish (US)
Title of host publication2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003 - Proceedings
PublisherIEEE Computer Society
Pages327-330
Number of pages4
ISBN (Electronic)0780379764
DOIs
StatePublished - 2003
Event2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003 - San Francisco, United States
Duration: Aug 12 2003Aug 14 2003

Publication series

NameProceedings of the IEEE Conference on Nanotechnology
Volume1
ISSN (Print)1944-9399
ISSN (Electronic)1944-9380

Other

Other2003 3rd IEEE Conference on Nanotechnology, IEEE-NANO 2003
Country/TerritoryUnited States
CitySan Francisco
Period8/12/038/14/03

Keywords

  • Atomic layer deposition
  • Carbon nanotubes
  • Chemical processes
  • Degradation
  • Energy resolution
  • Microscopy
  • Robustness
  • Silicon
  • Substrates
  • Tunneling

ASJC Scopus subject areas

  • Bioengineering
  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Condensed Matter Physics

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