Direct fabrication of 3D periodic inorganic microstructures using conformal phase masks

Matthew C. George; Erik C. Nelson; John A. Rogers; Paul V. Braun

doi:10.1002/anie.200804171

Direct fabrication of 3D periodic inorganic microstructures using conformal phase masks

Matthew C. George, Erik C. Nelson, John A. Rogers, Paul V. Braun

Research output: Contribution to journal › Article › peer-review

Abstract

Nitty gritty: A chemically amplified poly-(methylsilsesquioxane) resist based on the acid-catalyzed condensation of silanol end groups was developed for direct fabrication of hybrid 3D microstructures (see picture) by conformal and maskless proximity-field nanopatterning. Fibers, colloidal particles, helical arrays, and photonic crystals were fabricated by varying phase-mask design and exposure conditions. (Figure Presented).

Original language	English (US)
Pages (from-to)	144-148
Number of pages	5
Journal	Angewandte Chemie - International Edition
Volume	48
Issue number	1
DOIs	https://doi.org/10.1002/anie.200804171
State	Published - 2009

Keywords

Nanoimprinting
Nanolithography
Photochemistry
Silsesquioxanes

ASJC Scopus subject areas

General Chemistry
Catalysis

Online availability

10.1002/anie.200804171

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KW - Nanolithography

KW - Photochemistry

KW - Silsesquioxanes

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Direct fabrication of 3D periodic inorganic microstructures using conformal phase masks

Abstract

Keywords

ASJC Scopus subject areas

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