Abstract
We built a compact, common path, laser epi-illumination diffraction phase microscope (epi-DPM) for defect detection on a patterned semiconductor wafer. The wafer's underlying structure and buried defects with ∼ 100 nm size were measured.
Original language | English (US) |
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Title of host publication | 2012 IEEE Photonics Conference, IPC 2012 |
Pages | 644-645 |
Number of pages | 2 |
DOIs | |
State | Published - Dec 1 2012 |
Event | 25th IEEE Photonics Conference, IPC 2012 - Burlingame, CA, United States Duration: Sep 23 2012 → Sep 27 2012 |
Other
Other | 25th IEEE Photonics Conference, IPC 2012 |
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Country/Territory | United States |
City | Burlingame, CA |
Period | 9/23/12 → 9/27/12 |
Keywords
- diffraction
- microscope
- phase microscope
- wafer inspection
ASJC Scopus subject areas
- Electrical and Electronic Engineering