Diffraction phase microscopy for wafer inspection

Renjie Zhou, Chris Edwards, Gabriel Popescu, Lynford L. Goddard

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We built a compact, common path, laser epi-illumination diffraction phase microscope (epi-DPM) for defect detection on a patterned semiconductor wafer. The wafer's underlying structure and buried defects with ∼ 100 nm size were measured.

Original languageEnglish (US)
Title of host publication2012 IEEE Photonics Conference, IPC 2012
Pages644-645
Number of pages2
DOIs
StatePublished - 2012
Event25th IEEE Photonics Conference, IPC 2012 - Burlingame, CA, United States
Duration: Sep 23 2012Sep 27 2012

Publication series

Name2012 IEEE Photonics Conference, IPC 2012

Other

Other25th IEEE Photonics Conference, IPC 2012
Country/TerritoryUnited States
CityBurlingame, CA
Period9/23/129/27/12

Keywords

  • diffraction
  • microscope
  • phase microscope
  • wafer inspection

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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