Abstract
A low-pressure flat flame burner was constructed and used to grow diamond films on silicon and molybdenum substrates in oxygen-acetylene flames at 40 Torr. Both isolated, well faceted diamond particles and continuous films covering the entire substrate (12 cm2) were grown. Nucleation was found to be significantly enhanced by altering the flame conditions initially, thereby depositing a thin, non-diamond carbon layer onto the silicon substrates. This procedure was required to grow continuous films. Flame simulations were carried out, and explain why the flame stoichiometry required for diamond growth at low pressure differs significantly from that required at atmospheric pressure.
Original language | English (US) |
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Pages (from-to) | 122-126 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 212 |
Issue number | 1-2 |
DOIs | |
State | Published - May 15 1992 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry